Term II - 2011/2012

INSTRUCTOR:

Dr. Leyla Soleymani- ETB 407- (905) 525-9140 ext 27204- soleyml@mcmaster.ca

Office hours: Wednesdays 1:30 PM - 2:30 PM, ETB 407

TIMES:

Mondays 9:30-10:20 JHE 234- computer cluster-based  lecture per week

Monday/Wednesday 11:30-12:20 ETB 230

TA:

Dixon Paez- paezcadj@mcmaster.ca

Office: ETB-529 or JHE-A312-Office hours: TBA

TEXT BOOK:

Avenue to Learn course shell

Compulsory Text book

"Silicon VLSI Technology", J D Plummer, M D Deal, and P B Griffin, Prentice-Hall, 2000

Reference Text books "Semiconductor Manufacturing Technology", Michael Quirk and Julian Serda, Prentice Hall, 2001; "ULSI Technology" C Y Chang and S M Sze, McGraw-Hill, 1996, www.Silivaco.com

COURSE OUTLINE:

The objective of this course is to give an introduction to the theory and technology of micro/nanofabrication. Two thirds of the course is lecture-based, where the theory of basic processing techniques from the formation of semiconductor wafer material to the finished device assembly will be discussed.

One third of the lectures will be based in a classroom PC cluster. State-of-the-art process simulators are used to virtually fabricate semiconductor chips and subsequently test their electronic properties.

At the end of the course one should have a good understanding of the various processing techniques used to micro/nano fabricate semiconductor devices; and to be able to simulate these processes using process simulators.

LECTURES:

 

Topics	Text Chapters
Introduction to the Semiconductor Technology	Chap. 1
Properties of Semiconductor Materials	Chap. 1
Device Background	Chap. 1
CMOS Technology	Chap. 2
Crystal Growth and Wafer Fabrication	Chap. 3
Cleanrooms	Chap. 4
Lithography	Chap. 5
Oxidation and annealing	Chap. 6
Ion Implantation	Chap. 8
Diffusion	Chap. 7
Etching	Chap. 10
Thin Film Deposition	Chap. 9

 

ASSESSMENT:

Assignments	10%
Midterm exam	15%
Oral presentation	15%
Silvaco modules	20%
Final exam	40%

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The instructor and university reserve the right to modify elements of the course during the term. The university may change the dates and deadlines for any or all courses in extreme circumstances. If either type of modification becomes necessary, reasonable notice and communication with the students will be given with explanation and the opportunity to comment on changes. It is the responsibility of the student to check their McMaster email and course websites weekly during the term and to note any changes.

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POLICY REMINDERS:
Academic dishonesty consists of misrepresentation by deception or by other fraudulent means and can result in serious consequences, e.g. the grade of zero on an assignment, loss of credit with a notation on the transcript (notation reads: "Grade of F assigned for academic dishonesty"), and/or suspension or expulsion from the university.
It is your responsibility to understand what constitutes academic dishonesty. For information on the various kinds of academic dishonesty please refer to the Academic Integrity Policy, specifically Appendix 3, located at http://www.mcmaster.ca/senate/academic/ac_integrity.htm

The following illustrates only three forms of academic dishonesty:

1. Plagiarism, e.g. the submission of work that is not one's own or for which other credit has been obtained.
2. Improper collaboration in group work.
3. Copying or using unauthorized aids in tests and examinations.

The Faculty of Engineering is concerned with ensuring an environment that is free of all adverse discrimination. If there is a problem that cannot be resolved by discussion among the persons concerned, individuals are reminded that they should contact their Department Chair, the Sexual Harassment Officer or the Human Rights Consultant, as soon as possible.